surpass
American startup Substrate promises 2nm-class chipmaking with particle accelerators, at a tenth of the cost of EUV — X-ray lithography system has potential to surpass ASML’s EUV scanners
[ad_1] American startup Substrate is developing a new X-ray lithography (XRL) system, powered by a particle accelerator-based light source, that promises superior performance and cost efficiency compared to standard EUV lithography, aiming to achieve resolutions equivalent to ASML’s 2nm-class processes. The firm also claims it can advance beyond that. Substrate also claims that its efforts…