American startup Substrate promises 2nm-class chipmaking with particle accelerators, at a tenth of the cost of EUV — X-ray lithography system has potential to surpass ASML’s EUV scanners

[ad_1] American startup Substrate is developing a new X-ray lithography (XRL) system, powered by a particle accelerator-based light source, that promises superior performance and cost efficiency compared to standard EUV lithography, aiming to achieve resolutions equivalent to ASML’s 2nm-class processes. The firm also claims it can advance beyond that. Substrate also claims that its efforts…

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Types of Scanners

[ad_1] The scanner has become a vital piece of technology with the evolution of the digital world. What began as a simple device to capture an image of a paper sheet has evolved into a wide range of complex imaging options. Understanding the many sorts of scanners is critical nowadays, as they have advanced well…

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