EUV
Intel hedges its bet for High-NA EUV with the 14A process node — an alternate Low-NA technique has identical yield and design rules
Intel explained the rationale behind its High-NA EUV strategy at its Intel Foundry Direct 2025 conference this week. Despite persistent questions around cost-effectiveness, Intel has championed its use of the new High-NA EUV chipmaking tool with its forthcoming 14A process. However, Intel has not yet fully committed to using the new tool in production, but…
Intel has championed High-NA EUV chipmaking tools, but costs and other limitations could delay industry-wide adoption: Report
Intel has made significant strides in implementing High-NA EUV lithography by installing two High-NA litho machines, developing custom reticles as well as all-new optical proximity correction, and processing 30,000 wafers. However, major hurdles remain: the $380 million – $400 million tool cost and potential necessity to overhaul photomask supply chain limits economic viability of the…